Atomic Layer Deposition (ALD) and thin film technologies have become indispensable in modern materials science thanks to their ability to achieve angstrom‐level control over film thickness and ...

Thin films play a crucial role in the fabrication of several components and devices, such as protective coatings, integrated circuits, solar cells, and optical ...

As chips shrink to the nanometer scale, precise control over every fabrication step becomes essential. Atomic layer deposition (ALD) has emerged as a cornerstone of nanoelectronics, enabling the ...

The term "ALD" was first used around 2000. This technique achieves atomic layer control and conformal deposition through successive, self-limiting surface reactions. It involves introducing chemical ...

ALD is based on the sequential use of a gas phase chemical process. The ALD cycle consists of four main steps: (1) pulsing of a precursor A, (2) purging of the reactor to remove excess precursor and ...

A research team has made a significant breakthrough in thin film deposition technology. A research team, led by Professor Joonki Suh in the Department of Materials Science and Engineering and the ...

The laser wavelength, pulse duration, and fluence (energy density) significantly influence the ablation process and the resulting plasma plume. Shorter wavelengths and higher fluences generally lead ...

The rise of quantum computing threatens to break encryption systems that protect sensitive information across industries, from banking to defense.

Sumitomo Heavy Industries (SHI) has developed a new reactive plasma deposition (RPD) method to form ultra-thin tin oxide electron transport layers (ETL) for perovskite solar cells. It claims this ...

Following the publication of the revised Foreign Exchange and Foreign Trade Act in March 2023, the Japanese government on May 23 announced to impose export restrictions on 23 items of semiconductor ...

A research team, led by Professor Joonki Suh in the Department of Materials Science and Engineering and the Graduate School of Semiconductor Materials and Devices Engineering at UNIST, has made a ...