What is Reactive Ion Etching (RIE)? Reactive Ion Etching (RIE) is a dry etching technique widely used in the fabrication of micro- and nanodevices. It combines the chemical reactivity of reactive ...

It’s a problem that few of us will likely ever face: once you’ve built your first homemade integrated circuit, what do you do next? If you’re [Sam Zeloof], the answer is clear: build better integrated ...

LONDON — Deep reactive ion etching of silicon is being offered as a service by QinetiQ, the spin-out from Britain's Defence Evaluation Research Agency, and as one part of a micro-electro-mechanical ...

Researchers from Lam Research, the University of Colorado Boulder, and Princeton Plasma Physics Laboratory (PPPL) investigated ways to speed up the cryogenic reactive ion etching process for 3D NAND ...

The demand for accurate characterization of high aspect ratio geometries such as narrow gaps, deep trenches or deep holes arises in many technologies and industries. A variety of metrology techniques ...

Devices being manufactured using 2xnm and smaller etch applications run an increased risk of building up surface charges that can result in plasma induced device damage (PID). The Primo iDEA ...

Accurately characterizing high aspect ratio geometries—such as narrow gaps, deep trenches, and deep holes—is becoming increasingly important across a wide range of technologies and industries. To meet ...

Mass spectrometry, by contrast, is a powerful technique for the analysis of any process gas. Careful consideration of differences in pressure, reaction time scales and process flow is essential for ...